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Photoelectrochemical measurement of phthalic acid adsorption on porous Ti02 film electrodes

机译:TiO2多孔膜电极上邻苯二甲酸吸附的光电化学测量

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摘要

A new adsorption measurement method based on photoelectrochemical oxidation principles has been developed. The method can be used to directly quantify the amount of adsorbates at a TiO2 electrode surface in a sensitive and accurate manner. The adsorption of phthalic acid was studied as a test case. The relationship between the amount of adsorbate at the TiO2 surface and the concentration of phthalic acid in the solution was obtained. The adsorption of phthalic acid on TiO2 surface was shown to follow a Langmuir type adsorption model. For the first time, the adsorption equilibrium constant of an adsorbate at TiO2 surface has been photoelectrochemically measured. The adsorption equilibrium constant of phthalate on TiO2 porous film at pH 4.0, K=4.0ױ04 M-1, was obtained using our method, which was close to that obtained by conventional methods. The effect of solution pH on the amount of adsorbate at TiO2 surface was also investigated. The results indicate the adsorption of phthalic acid is mainly of chemical bonding nature.
机译:开发了一种基于光电化学氧化原理的吸附测量新方法。该方法可用于以灵敏和准确的方式直接定量TiO2电极表面的吸附物数量。研究了邻苯二甲酸的吸附作为测试案例。获得了TiO 2表面的吸附物量与溶液中邻苯二甲酸浓度之间的关系。邻苯二甲酸在TiO2表面的吸附表明遵循Langmuir型吸附模型。第一次,光电化学测量了被吸附物在TiO2表面的吸附平衡常数。用我们的方法获得了邻苯二甲酸酯在TiO2多孔膜上的pH 4.0时的吸附平衡常数,K = 4.0 ױ 04 M-1,与常规方法相近。还研究了溶液pH值对TiO2表面吸附量的影响。结果表明,邻苯二甲酸的吸附主要具有化学键性质。

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